西安硅片回收hydgphs蚀刻后为什么成彩色

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硅片刻蚀方法
&&文献是关于硅片切片和太阳能电池处理和制造方法的专利文献。
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你可能喜欢所有芯片制造厂都使用类似的设备,包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
本文提出利用在不同基材上制作出板波感测器用来即时监控湿蚀刻中石英晶片及矽晶片厚度之新颖方法。
This work presents a novel method based on the plate wave sensor for in-situ monitoring of the thickness of a wafer during wet etching.
这些纳米天线由蚀刻硅晶片制作而成,用到了制作微处理器所需的高端技术,塑料片可以塑型,能适合示汽车和任何便携式电子产品的外壳。
The stamps themselves are made by etching silicon wafers using the technique that makes microprocessors, and the sheets can be shaped to coat anything from cars to portable electronic devices.
本文主要研究臭氧水在单片晶圆旋式蚀刻机中,来去除晶圆表面的光阻的能力。
In this study, ozonized water in the single wafer processor was used to study photoresist stripping.
显然,任何斜角都能够加工到晶片内,并在蚀刻之后保留。
Nearly any bevel angle can be machined into the wafer which remains after etching.
此单元组还包括进行蚀刻或化学金属磨片的工人。
This unit group also includes workers who etch or chemically mill metal pieces.
这基本上是一个很小的坑硅蚀刻和两高硼硅晶片密封。
This is essentially a tiny pit etched in silicon and sealed between two Pyrex wafers.
这就是将成千上万个集成电路蚀刻在一块硅(芯)片上的能力硅片是具有半导体能力的非金属元件。
This was a ability to etch thousands of integrated circuits onto a tiny piece(chip)of silicon, which is a non-metallic element with semiconductor characteristics.
而卡罗式摄影法可以洗出多张照片,因此相当于蚀刻术或雕刻术。
Thee calotype could be made in series, and was thus the equivalent of an etching or an engraving.
用于玻璃,晶片及线路板,不锈钢在蚀刻过程中的保护。
To protect the glass, wafer and the circuit board in the etching process.
水彩色调:用硝酸在钢片或铜片上作腐蚀的蚀刻法。这个技巧是在版面上洒上一层薄薄的树脂粉,加热把它粘附于版面。
Aquatint: it is an etching process on copper or steel by means of nitric acid. in this technique a thin layer of resin dust is sprinkled on the plate and heated to make it adhere.
磷化铟晶片比硅片需要更屡次的积淀和蚀刻。
Phosphor changes indium chip to need more than silicon chip second precipitate and etch.
实验上,我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片,并量测该试片的反射频谱和接触角。
We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating. The performance is evaluated by measuring the reflectance spectrum and contact angle.
蚀刻-通过化学反应或物理方法去除晶圆片的多余物质。
Etch - A process of chemical reactions or physical removal to rid the wafer of excess materials.
单晶片、多腔的盒式处理平台,用于清洁、蚀刻、发展和电镀(电导检测器)。
Single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing and electroplating (ECD).
一种用于形成用于将焊料转 移到晶片的焊料模的方法包括将多个焊料腔蚀刻到基板中。
The method for forming a solder mold for transferring solder to a wafer includes etching a plurality of solder cavities into a substrate.
蚀刻-经由过程化学反响或物理方法去除晶圆片的多余物质。
Etch - A process of chemical reactions or physical removal to rid the wafer of excess materials.
由于蚀刻停止层可用可重复的方式形成,并且对晶片上的所有器件是共同的,所以在加热体高度上实现了相当大的均一性。
Since the etch stop layer may be formed in a repeatable way and is common across all the devices on a wafer, considerable uniformity is achieved in heater height.
本研究使用铁氟?阳极电化学蚀刻槽,配合氢氟酸与乙醇混合溶液进?阳极电化学反应,在矽晶片表面形成多孔矽的结构。
The anodization electrochemistry etching is studied on the silicon based substrates by SEM and AFM. Porous silicon structure is fabricated in Teflon container with HF and alcohol mixture solutions.
本研究使用铁氟?阳极电化学蚀刻槽,配合氢氟酸与乙醇混合溶液进?阳极电化学反应,在矽晶片表面形成多孔矽的结构。
The anodization electrochemistry etching is studied on the silicon based substrates by SEM and AFM. Porous silicon structure is fabricated in Teflon container with HF and alcohol mixture solutions.
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